Select your language
Dry gas
scrubbers
Extremely efficient and safe gas scrubbers
CS Clean Systems
CS Clean Systems is your trusted supplier of dry gas scrubbers for use in the semiconductor industry and affiliated high-tech industries and R&D applications.
The scrubber technology, which ensures very efficient cleaning, has been used for over 30 years for the capturing of corrosive, flammable and highly toxic gases from exhaust gas flows. CS Clean Systems not only supplies and installs the systems but, from its Benelux Service Centre, also provides for the maintenance and refill of the installation.
Semiconductor production
Scrubbers for, among other things, ion implanters, plasma etching and CVD tools.
Semiconductor production
Gas cleaners for MOCVD, CIGS Photovoltaic processes.
Specialty gasses
Cleaning and gas cabinet solutions for, among others, SF6, CF4, SiH4.
R & D
Scrubbers and gas cleaners for small applications and incidental use.
Unique scrubber technology
The extremely maintenance-friendly scrubbers ensure a very efficient cleaning, through to the lowest PPM level. As such, many of our systems are monitored by an end-point gas detector.
The systems of CS Clean Systems use the advanced CLEANSORB chemisorption technology to realise unparalleled gas cleaning, combined with easy-to-use controls.
The dry chemisorption systems don’t use any electricity, water, or fuel. Furthermore, there is no pollution of valuable water supplies from disposal of contaminated wastewater.
One column of CLEANSORB granulate generally binds several thousands of litres of hazardous gas into safe, solid by-products. Used CLEANSORB columns aren’t thrown out, instead they are refilled with fresh absorbent material, resulting in minimal quantities of waste product.
CLEANSORB granulate converts hazardous gases into stabile inorganic salts, at ambient temperature. This is the highest quality and most environmentally friendly purification technology available for waste gas flows. A wide range of CLEANSORB column sizes is available, to meet the needs of all of our clients, from small-scale university research institutions to 24-hour wafer production facilities.
CS Clean Systems has more than 30 years of experience in dry chemisorption technology and offers optimised solutions for all process applications.
Services & Support
As a Service Centre, we take care of the maintenance and refill of the installation. In essence, we switch out the scrubber columns in the system for you, based on agreements with you about the response time, to guarantee maximum up-time for your systems.
Gases
The CS Clean Systems gas scrubbers can be used for a wide variety of applications and gases. This includes options for cleaning multiple gases within a single installation.
View gases by process
| Process Application | Typical Gases or Liquid Precursors Used |
| Plasma Etch | |
| Metal Etch | Cl2, BCl3, HCl, CF4, SF6 |
| Poly Silicon Etch | Cl2, HBr, Br2, SF6, CF4, NF3, C4F8 |
| Nitride Etch, Oxide Etch | CF4, CHF3, C2F6, C3F8, C4F8, CH2F2, NF3, SF6, O2 |
| Tungsten Etchback | SF6 |
| Ion Implantation | |
| High, Medium, Low | AsH3, PH2020-10-08-sgs-gas-0918, BF3, P, As, Sb, Sb(CH3)3, GeH4, GeF4, TMGa, GaI3 |
| ALD, LPCVD, PECVD, HDP-CVD | |
| TEOS, undoped | TEOS, O2, O3 |
| BPSG | TEOS, O3, TMP, TMB, SiH4, PH3, B2H6 |
| Poly-Si (doped) | SiH4, (AsH3, PH3) |
| Silicon Germanium | SiH4, GeH4 |
| Oxide | SiH4, O2 |
| Nitride, (doped) | SiH4, NH3, (TMP, TMB, SiH4, PH3, B2H6) |
| Oxynitride, (doped) | SiH4, NH3, N2O, (TMP, TMB, SiH4, PH3, B2H6) |
| Low-k dielectrics | 1MS, 2MS, 3MS, 4MS, DMDMOS |
| High-k dielectrics | TMA, TEMAH, TDEAH, TAETO, PET |
| Gate Electrodes | MPA, Ru(Etcp)2, PEMAT |
| Copper & Cobalt CVD | Cu(hfac)(TMVS), Cobaltocene and related metalorganics |
| Tungsten (Silicide) | WF6, SiH4, (DCS) |
| Barrier Layers | TiCl4, NH3, TDMAT, PDMATa, PDEATa, TAETO, W(CO)6 |
| Plasma Cleaning | |
| PFC plasma | C2F6, C4F8, NF3 |
| Remote NF3 plasma | F2 |
| Epitaxy | |
| Silicon (doped) | DCS, TCS, SiH4, HCl, (AsH3, PH3, B2H6) |
| Silicon-Germanium | SiH4, GeH4, CBr4, 1MS, 2MS, 3MS, HCl |
| Silicon-Carbide (SiC) | SiH4, TMAI, HCl |
| Compound Semiconductors, Optoelectronics, III-V on Si | |
| GaAs, InP MOCVD (OMVPE) | AsH3, PH3, TMAl, TMGa, TMln, TBA, TBP, SbH3, HCl, Cl2 |
| GaN MOCVD Chamber Clean | HCl, Cl2 |
| MBE (MOMBE) | As, P, AsH3, PH3, SbH3 |
| III-V Etch | Cl2, BCl3, HBr, SiF4, SF6, CH4, GaCl3, InCl3, AsH3, O2 |
| Photovoltaics | |
| Concentrator Photovoltaics | PH3, AsH3, lll-V metalorganics, SiH4, GeH4 |
| CIGS | H2S, H2Se |
View the brochure
Contact us!
Contact details
CS Clean Systems Benelux B.V.
Maxwellstraat 5
1704 SG Heerhugowaard
Tel: +31 72 571 7666
Email: sales@cscleanbenelux.net
